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INDRODUCTIONMeso-poroussilicafilmswithanexcellentheat-insulatingpropertyandtherelativelylowdielectricvalueplayparticularlyimportantroleinelectronicandmagneticdevices(Moonetal.,1997),etc.;thosewithporesizesof5nmto50nmarealsoofinterestforapplicationsinphotonics,optoelec-tronics,lightweightstructuralmaterialthermalin-sulation,opticalcoating(Moonetal.,1997;HusingandSchulert,1998;Davis,2002).Theirspecialnetworkstructureisusedinsounddetector(HusingandSchubert,1998);theirexcellentinsulatingpro… 相似文献
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A homogeneous crack-free nano- or meso-porous silica films on silicon was fabricated by colloidal silica sol derived by hydrolyzing tetraethyl orthosilicate (TEOS) catalyzing with (C4H9)4N OH- in water medium. The solution with ratio of H2O/TEOS≥15, R4N and glycerol as templates, combining with the hydrolyzed intermediate, controlled the silica aggregating; the templated silica film with heterostructure was developed into homogeneous nano-porous then meso-porous silica films after being annealed from 750 ℃ to 850 ℃; the formation mechanism of the porous silica films was discussed; morphologies of the silica films were characterized. The refractive indexes of the porous silica films were 1.256-1.458, the thermal conductivity < 0.7 W/m/K. The fabricating procedure and the sequence had not been reported before. 相似文献
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