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低压等离子体结合热解法制备金刚石膜
引用本文:庞国锋,韩惠雯.低压等离子体结合热解法制备金刚石膜[J].科技通报,1995,11(1):1-6.
作者姓名:庞国锋  韩惠雯
作者单位:杭州大学特种材料研究所,杭州半导体厂
基金项目:国家自然科学基金,浙江省自然科学基金
摘    要:金刚石膜具有天然金刚石相拟的优异特性,预计会有十分广阔的应用前景,本文介绍了一种新颖的金刚石膜生长技术-强流电子增强化学气相沉积法,它结合了传统的热丝法和等离子体法各自的优点,成为一种具有较高生长速率,能够制备大面积均匀金刚石膜的技术,对用这种方法制备的金刚石膜进行了喇曼、扫描电镜和X-Ray衍射分析,并对这项技术的优点作了阐述。

关 键 词:金刚石    等离子体法  热解法  低压  生长

Diamond Film Growth by Low DC Voltage Plasma CVD Method Assisted with Thermolysis
Pang Guofeng, Shi Chengru, Han Huiwen.Diamond Film Growth by Low DC Voltage Plasma CVD Method Assisted with Thermolysis[J].Bulletin of Science and Technology,1995,11(1):1-6.
Authors:Pang Guofeng  Shi Chengru  Han Huiwen
Abstract:The synthetic diamond films have many superior properties like natural diamond so that they are pre-sumed to have a glorious future of potential applications.A novel technique was presented in this work,whichwas called Intense Electron-current Enhanced Chemical Vapor Deposition(IECVD).It possesses the advan-tages of both the conventional hot filament CVD and the plasma CVD so that it could prepare large area ho-mogeneous diamond film with higher growth rate. The diamond films synthesized with this method were char-acterized by Raman spectroscopy,SEM,and XRD.
Keywords:diamond film  Intense electron-current  Raman spectroscopy
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