| 脉冲激光沉积PLD技术及其应用 |
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| 引用本文： | 吕珂.脉冲激光沉积PLD技术及其应用[J].科技广场,2009(5):131-133. |
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| 作者姓名： | 吕珂 |
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| 作者单位： | 华东交通大学基础学院物理系,江西,南昌,330013 |
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| 摘 要： | 本文综述了脉冲激光沉积(PLD)薄膜技术的机理、特点及薄膜生长的主要过程,并介绍了其在制备半导体、高温超导、类金刚石、生物陶瓷薄膜等方面的应用.大量研究表明,脉冲激光沉积技术是目前最好的制备薄膜的方法之一.
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| 关 键 词： | 薄膜制备 |
Pulsed Laser Deposition and its Application |
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| Lv Ke.Pulsed Laser Deposition and its Application[J].Science Mosaic,2009(5):131-133. |
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| Authors: | Lv Ke |
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| Institution: | School of Basic Science;East China Jiaotong University;Jiangxi Nanchang 330013 |
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| Abstract: | In this paper,we have elaborated the mechanism,characteristics and the growth process of film of pulsed laser deposition technique.We also have introduced its application in preparing semiconductor,high Tc superconductor,diomand and bioceramic thin films.The researches show that PLD is a new promising technique for growing thin films. |
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| Keywords: | PLD |
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