| TCAD在“半导体工艺”课程中应用的教学探讨 |
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| 引用本文： | 戚玉婕.TCAD在“半导体工艺”课程中应用的教学探讨[J].扬州教育学院学报,2013(3):85-88. |
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| 作者姓名： | 戚玉婕 |
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| 作者单位： | 扬州职业大学,江苏扬州225009 |
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| 摘 要： | 分析了TCAD技术的主要功能，探讨其在“半导体工艺”课程教学中的应用。并以半导体工艺中的蚀刻为例，利用TCAD技术中ATHENA工艺仿真模块，对比了湿法蚀刻和干法蚀刻的特点。
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| 关 键 词： | TCAD ATHENA 半导体工艺 蚀刻 |
The Application of TCAD to the Teaching of Semiconductor Technology |
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| QI Yu-jie.The Application of TCAD to the Teaching of Semiconductor Technology[J].Journal of Yangzhou College of Education,2013(3):85-88. |
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| Authors: | QI Yu-jie |
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| Institution: | QI Yu-jie (Yangzhou Polytechnic College, Yangzhou 225009, China) |
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| Abstract: | In this paper, the main function of TCAD technology is analyzed and its application to the teaching of Semiconductor Technology is discussed. Meanwhile, taking etching in semiconductor process for example, the char-acteristics of wet etching and dry etching are compared by using ATHENA simulation module of TCAD technology. |
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| Keywords: | TCAD ATHENA Semiconductor Technology etching |
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