| 亚纳米级抛光加工实验室的管理与维护 |
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| 引用本文： | 尹红,黄崇利.亚纳米级抛光加工实验室的管理与维护[J].实验技术与管理,2012,29(4):204-206,213. |
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| 作者姓名： | 尹红 黄崇利 |
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| 作者单位： | 1. 海南大学政治与公共管理学院,海南海口,570228
2. 海南大学应用科技学院,海南海口,570228 |
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| 基金项目： | 教育部人文社科青年项目，上海市教育委员会科研创新项目资助，海南大学青年基金，海南省自然科学规划项目 |
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| 摘 要： | 亚纳米级抛光是获得超光滑表面的主要方法。目前,常用的亚纳米级抛光方法有化学机械抛光(CMP)、电化学机械抛光(ECMP)、无磨料化学机械抛光(AP-CMP)、磁流变抛光(MRP)等。亚纳米级抛光质量受抛光液、抛光条件和抛光环境等诸多方面的影响。抛光实验室的抛光环境是超光滑表面的重要影响因素之一,必须对抛光环境的各个方面加以科学管理和维护。
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| 关 键 词： | 亚纳米级抛光 平整度 超光滑表面 超洁净 |
Management and maintenance of atom-scale polishing laboratory |
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| Yin Hong
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Huang Chongli.Management and maintenance of atom-scale polishing laboratory[J].Experimental Technology and Management,2012,29(4):204-206,213. |
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| Authors: | Yin Hong Huang Chongli |
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| Institution: | 1.School of Politics and Public Administration,Hainan University,Haikou 570228,China; 2.College of Applied Science and Technology,Hainan University,Haikou 570228,China) |
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| Abstract: | With the rapid improvement of electronic manufacturing technology,the demand for super-smooth surfaces becomes increasing.Atom-scale polishing is the main method to achieve super-smooth surfaces.At present,chemical mechanical polishing(CMP),electro-chemical mechanical polishing(ECMP),abrasive-free chemical mechanical polishing(AP-CMP),magnetorheological polishing(MRP),etc.are the commonly used methods in atom-scale polishing.The influences on polishing are as follows: polishing slurry,polishing parameters,polishing environment,etc.Among them,the laboratory environment is one of the main factors that must be managed and maintained. |
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| Keywords: | atom-scale polishing planarization super-smooth surface ultra-cleaning |
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