| 4.5G PAMAM为保护剂CdS纳米粒子的合成 |
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| 引用本文： | 乔燕.4.5G PAMAM为保护剂CdS纳米粒子的合成[J].包头职业技术学院学报,2014(2):23-25. |
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| 作者姓名： | 乔燕 |
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| 作者单位： | 包头轻工职业技术学院检测技术学院,内蒙古包头014035 |
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| 摘 要： | 硫化镉CdS纳米材料的制备常见的方法有:气相法、液相法、和固相法。我们采用液相法以4.5G PAMAM树状大分子为保护剂制备了CdS纳米粒子,考察了保护剂4.5G PAMAM与CdS不同物质的量比时,纳米粒子大小和尺寸的变化情况。
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| 关 键 词： | 液相法 制备 .G PAMAM CdS纳米粒子 |
4.5 G PAMAM- protected CdS Nanoparticles Synthesized |
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| Qiao Yan.4.5 G PAMAM- protected CdS Nanoparticles Synthesized[J].Journal of Baotou Vocational & Technical College,2014(2):23-25. |
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| Authors: | Qiao Yan |
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| Institution: | Qiao Yan (Testing Technology Institute, BaoTou Light Industry Vocational Technical College, Baotou, Inner Mongolia 014035 ) |
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| Abstract: | Cadmium sulfide is a particularly important photoelectric semiconductor material, which has been widely used in light,electricity,magnetism,catalysis and other fields ; Because of its excellent properties, it has attracted many scientists＇ attention. Firstly,4.5G PAMAM dendrimers have been synthesized;Then, CdS nanoparticles are prepared by 4.5G PAMAM dendrimers as protecting agellt in aqueous solution and are the particle size uniformity;at the same time, this article exam- ines the prepared nanoparticles sizes and dimensions effect as 4.5G PAMAM and CdS different ratio change. |
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| Keywords: | semiconductor materials CdS nanoparticles 4 5G PAMAM |
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