| RFCVD法沉积类金刚石膜的研究 |
| |
| 引用本文： | 王益军,严诚.RFCVD法沉积类金刚石膜的研究[J].咸阳师范学院学报,1999(6). |
| |
| 作者姓名： | 王益军 严诚 |
| |
| 作者单位： | 咸阳师范专科学校物理学系!陕西咸阳，712000，西安应用光学研究所二室!陕西西安，710100 |
| |
| 摘 要： | 研究了利用RFCVD技术，在铝片等基体表面沉积类金刚石膜。对膜的硬度、电阻率、附着力进行分析发现，在合适的气体流量比和射频功率密度下，这些性能可显著提高。
|
| 关 键 词： | 类金刚石膜 RFCVD 功率密度 |
Study of the diamond like carbon films produced by RFCVD deposition technology |
| |
| Wang Yijun , Yan cheng.Study of the diamond like carbon films produced by RFCVD deposition technology[J].Journal of Xianyang Normal University,1999(6). |
| |
| Authors: | Wang Yijun Yan cheng |
| |
| Abstract: | By RFCVD deposition technology,diamond like carbon films on the Al and other Substracts were producted. when we had analysed the hardness,resistivity,adhesion of the DLC films,we found that those of the films were improved remarkably under the condition of the proper radio frequency power densities and vaper flow ratio |
| |
| Keywords: | A-C:Hflims RFCVD power density |
| 本文献已被 CNKI 等数据库收录！ |
