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不同退火温度下ZnO薄膜结构及光学特性的表征
引用本文:崔舒,沈慧娟.不同退火温度下ZnO薄膜结构及光学特性的表征[J].通化师范学院学报,2009,30(4).
作者姓名:崔舒  沈慧娟
作者单位:通化师范学院物理系,吉林通化134002;吉林师范大学
摘    要:采用溶胶凝胶(sol-gel)法,在普通载玻片上成功制备ZnO薄膜,对于不同退火温度样品采用X射线衍射仪(XRD)、原子力显微镜(AFM)、紫外可见分光光度计(UVS)及光致荧光光谱(PL)对样品的结构、形貌和光学特性进行表征.XRD谱表明在300℃、400℃、500℃退火处理的样品都有较好的c轴择优取向,而且随着退火温度的升高择优取向明显改善.透射谱中能观察到明显的ZnO吸收边.用AFM观察到的样品表面形貌表明,退火温度提高使样品表面更加平整,同时粒径变大.PL谱中在380nm附近可观察到明显发光峰.

关 键 词:sol-gel法  ZnO薄膜  退火温度  形貌

Structure of ZnO Thin Films and Characterization of Optical Properties under Different Annealing Temperatures
CUI Shu,SHEN Hui-juan.Structure of ZnO Thin Films and Characterization of Optical Properties under Different Annealing Temperatures[J].Journal of Tonghua Teachers College,2009,30(4).
Authors:CUI Shu  SHEN Hui-juan
Institution:1.Department of physics; Tonghua Normal University; Tonghua; Jilin 134002; China; 2.School of Physics; Jilin Normal University; Siping; Jilin 136000; China);
Abstract:ZnO thin films were deposited on simple glass substrate by sol-gel technique.The structure,morphology and optical properties of the annealed ZnO thin films were characterized by X-ray diffraction(XRD),atomic force microscope(AFM),ultra-violet spectrometer(UVS) and photoluminescence(PL) spectroscopy,respectively.The X-ray diffraction(XRD) experiments showed that the annealed samples at 300℃,400℃,500℃ are better c-axis orientation,but the c-axis orientation was improved as the annealing temperature increased....
Keywords:sol-gel  ZnO thin film  annealing temperature  morphology
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