Rapid mask prototyping for microfluidics |
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| Authors: | B G C Maisonneuve T Honegger J Cordeiro O Lecarme T Thiry D Fuard K Berton E Picard M Zelsmann D Peyrade |
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| Institution: | 1.Univ. Grenoble Alpes, LTM, F-38000 Grenoble, France;2.CNRS, LTM, F-38000 Grenoble, France;3.CEA, INAC-SiNAPS, F-38054 Grenoble, France |
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| Abstract: | With the rise of microfluidics for the past decade, there has come an ever more pressing need for a low-cost and rapid prototyping technology, especially for research and education purposes. In this article, we report a rapid prototyping process of chromed masks for various microfluidic applications. The process takes place out of a clean room, uses a commercially available video-projector, and can be completed in less than half an hour. We quantify the ranges of fields of view and of resolutions accessible through this video-projection system and report the fabrication of critical microfluidic components (junctions, straight channels, and curved channels). To exemplify the process, three common devices are produced using this method: a droplet generation device, a gradient generation device, and a neuro-engineering oriented device. The neuro-engineering oriented device is a compartmentalized microfluidic chip, and therefore, required the production and the precise alignment of two different masks. |
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