| Science Letters：Mask synthesis and verification based on geometric model for surface micro-machined MEMS |
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| 引用本文： | 李建华,刘玉生,高曙明.Science Letters：Mask synthesis and verification based on geometric model for surface micro-machined MEMS[J].浙江大学学报(A卷英文版),2005,6(9):1007-1010. |
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| 作者姓名： | 李建华 刘玉生 高曙明 |
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| 作者单位： | State Key Lab of UAD＆CG. Zhejiang University, Hangzhou 310027, China |
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| 基金项目： | Project supported by the National Natural Science Foundation of China (Nos. 60273057 and 60403049) and the National Basic Re-search Program (973) of China (No. 2002CB312106) |
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| 摘 要： | INTRODUCTION When designers develop microelectromechani- cal system (MEMS) devices with the traditional ap- proach, they should devise the mask-layouts and fabrication process instead of the function and shape of the MEMS device. The geometric model of the MEMS device is then derived based on the simulated fabrication according to the devised mask layout and the process. This is analogous to generating a geo- metric model from the NC tool paths in the macro world. Obviously it is uni…
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| 关 键 词： | CAD 计算机辅助设计 几何模型 显微机械加工 MEMS |
| 收稿时间： | 2005-02-10 |
| 修稿时间： | 2005-05-25 |
Mask synthesis and verification based on geometric model for surface micro-machined MEMS |
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| Li Jian-hua,Liu Yu-sheng,Gao Shu-ming.Mask synthesis and verification based on geometric model for surface micro-machined MEMS[J].Journal of Zhejiang University Science,2005,6(9):1007-1010. |
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| Authors: | Li Jian-hua Liu Yu-sheng Gao Shu-ming |
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| Institution: | (1) Present address: State Key Lab of CAD&CG, Zhejiang University, 310027 Hangzhou, China |
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| Abstract: | Traditional MEMS (microelectromechanical system) design methodology is not a structured method and has become an obstacle for MEMS creative design. In this paper, a novel method of mask synthesis and verification for surface mi- cro-machined MEMS is proposed, which is based on the geometric model of a MEMS device. The emphasis is focused on syn- thesizing the masks at the basis of the layer model generated from the geometric model of the MEMS device. The method is comprised of several steps: the correction of the layer model, the generation of initial masks and final masks including multi-layer etch masks, and mask simulation. Finally some test results are given. |
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| Keywords: | MEMS CAD Geometric model Layer model Mask synthesis Surface micromachining |
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