| Ti-50．9at％Ni薄膜组织和相转变的研究 |
| |
| 引用本文： | 焦华,曹伟产,王庆相.Ti-50．9at％Ni薄膜组织和相转变的研究[J].渭南师范学院学报,2011(12):60-63. |
| |
| 作者姓名： | 焦华 曹伟产 王庆相 |
| |
| 作者单位： | 1. 渭南师范学院化学与生命科学学院,陕西渭南,714000
2. 西安理工大学材料学院,西安,710048 |
| |
| 摘 要： | 采用磁控溅射方法在Si片沉积了Ti-50．9at％Ni形状记忆合金薄膜，并将薄膜分别在不同温度下进行退火．利用示差扫描量热方法（DSC）、X射线衍射仪（XRD）、透射电镜（TEM）研究了薄膜退火前后形貌、相变特征及应力随退火温度的变化．实验结果表明：溅射态薄膜为非晶态，其晶化温度范围为430℃-535℃，晶化同时伴随着Ti3Ni4相的析出；退火后的薄膜随着退火温度的升高，Rs、Af、Ms均呈上升趋势．薄膜的残余应力随着退火温度的增加而逐渐减少．
|
| 关 键 词： | Ti-50．9at％Ni薄膜 退火温度 形貌变化 相变 残余应力 |
Research of the Structure and Phase Transformation of Ti-50.9at%Ni Films |
| |
| JIAO Hua,CAO Wei-chan,WANG Qing-xiang.Research of the Structure and Phase Transformation of Ti-50.9at%Ni Films[J].Journal of Weinan Teachers College,2011(12):60-63. |
| |
| Authors: | JIAO Hua CAO Wei-chan WANG Qing-xiang |
| |
| Institution: | 1 School of Chemistry and Life Science,Weinan Teachers University,Weinan 714000,China;2 School of Materials Science and Engineering,Xi’an University of Technology,Xi’an 710048,China) |
| |
| Abstract: | The Ti-50.9at% Ni shape memory alloy thin flms are deposited on pure Si substrate by DC-magnetron sputtering.The films were then annealed at different temperatures for 30 min.The effect of annealing temperature on the microstructure,transformation behavior and residual stress of the films was characterized by differential scanning calorimeter,X-ray diffraction and transmission electron microscopy.The results show that the deposited films were amorphous and range of crystallization temperature was 430℃-535℃ with appearance of the precipitate phase(Ni4Ti3).As the annealing temperature increased,all of the Rs,Af and Ms increased as well while the residual stress is gradually decreased. |
| |
| Keywords: | Ti-50 9at% Ni films annealing temperature morphology diversification phase transition residual stress |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
