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基于垂直扫描显微干涉技术的高精度轮廓仪
引用本文:戴蓉,谢铁,邦龚文,常素萍.基于垂直扫描显微干涉技术的高精度轮廓仪[J].上海大学学报(英文版),2008,12(3):255-260.
作者姓名:戴蓉  谢铁  邦龚文  常素萍
作者单位:DAI Rong (School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P. R. China;School of Mechanical and Electronic Engineering, Wuhan University of Technology, Wuhan 430070, P. R. China)  XIE Tie-bang (School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P. R. China)  GONG Wen (School of Mechanical and Electronic Engineering, Wuhan University of Technology, Wuhan 430070, P. R. China)  CHANG Su-ping (School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P. R. China)
摘    要:A profilometer used for 3 dimension measurement of micro-surface topography is presented. The instrument is based on the vertical scanning microscopic interferometry (VSMI). A Linnik type interference microscope is used and the interferograms which present changes of surface profile are recorded with a CCD camera. A developed nano-positioning work stage with an integrated optical grating displacement measuring system realizes the precise vertical scanning motion during profile measurement. By a white-light phase shifting algorithm of arbitrary step, frames of interferograms are processed by a computer to rebuild and evaluate the measured profile. Because of the specialty of VSMI, the profilometer is suitable for both smooth and rough surface measurement. It can also be used to measure curved surfaces, dimension of micro electro mechanical systems (MEMS), etc. The vertical resolution of the profilometer is 0.5 nm, and lateral resolution 0.5 μm.

关 键 词:垂直扫描显微干涉技术  精度  轮廓仪  三维测量
收稿时间:2006-10-31
修稿时间:2006年10月31

A high precision profilometer based on vertical scanning microscopic interferometry
DAI Rong,XIE Tie-bang,GONG Wen,CHANG Su-ping.A high precision profilometer based on vertical scanning microscopic interferometry[J].Journal of Shanghai University(English Edition),2008,12(3):255-260.
Authors:DAI Rong  XIE Tie-bang  GONG Wen  CHANG Su-ping
Institution:1. School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P. R. China;School of Mechanical and Electronic Engineering, Wuhan University of Technology, Wuhan 430070, P. R. China
2. School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P. R. China
3. School of Mechanical and Electronic Engineering, Wuhan University of Technology, Wuhan 430070, P. R. China
Abstract:A profilometer used for 3 dimension measurement of micro-surface topography is presented. The instrument is based on the vertical scanning microscopic interferometry (VSMI). A Linnik type interference microscope is used and the interferograms which present changes of surface profile are recorded with a CCD camera. A developed nano-positioning work stage with an integrated optical grating displacement measuring system realizes the precise vertical scanning motion during profile measurement. By a white-light phase shifting algorithm of arbitrary step, frames of interferograms are processed by a computer to rebuild and evaluate the measured profile. Because of the specialty of VSMI, the profilometer is suitable for both smooth and rough surface measurement. It can also be used to measure curved surfaces, dimension of micro electro mechanical systems (MEMS), etc. The vertical resolution of the profilometer is 0.5nm, and lateral resolution 0.5μm.
Keywords:profilometer  vertical scanning microscopic interferometry (VSMI)  interference microscope  work stage  piezoelectric (PZT) actuator  flexural hinge
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