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INTRODUCTION When designers develop microelectromechani- cal system (MEMS) devices with the traditional ap- proach, they should devise the mask-layouts and fabrication process instead of the function and shape of the MEMS device. The geometric model of the MEMS device is then derived based on the simulated fabrication according to the devised mask layout and the process. This is analogous to generating a geo- metric model from the NC tool paths in the macro world. Obviously it is uni… 相似文献
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